Title:
FLUORINE-CONTAINING COMPOSITION, SUBSTRATE FOR PATTERNING, PHOTO-DEGRADABLE COUPLING AGENT, METHOD FOR PATTERNING, AND MANUFACTURING METHOD FOR TRANSISTOR
Document Type and Number:
WIPO Patent Application WO/2016/136817
Kind Code:
A1
Abstract:
A fluorine-containing composition according to the present invention comprises a fluorine-containing compound represented by general formula (1) and a fluorine-based solvent.
Inventors:
KAWAKAMI YUSUKE (JP)
YAMAGUCHI KAZUO (JP)
YAMAGUCHI KAZUO (JP)
Application Number:
PCT/JP2016/055456
Publication Date:
September 01, 2016
Filing Date:
February 24, 2016
Export Citation:
Assignee:
NIKON CORP (JP)
International Classes:
G03F7/075; B05D1/32; B05D3/10; G03F7/004
Domestic Patent References:
| WO2005054256A1 | 2005-06-16 | |||
| WO2012036053A1 | 2012-03-22 | |||
| WO2015029981A1 | 2015-03-05 |
Foreign References:
| JP2003321479A | 2003-11-11 | |||
| JP2008096596A | 2008-04-24 | |||
| JPH06248256A | 1994-09-06 | |||
| JP2013244470A | 2013-12-09 |
Other References:
KONISHI ET AL.: "Kobunkaisei Carbamate-gata Silane Coupling-zai 1", THE 62ND SYMPOSIUM ON MACROMOLECULES YOKOSHU, 28 August 2013 (2013-08-28), pages 3723
Attorney, Agent or Firm:
SHIGA Masatake et al. (JP)
Masatake Shiga (JP)
Masatake Shiga (JP)
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