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Title:
FLUORINE-CONTAINING COMPOUND, FLUORINE-CONTAINING SURFACTANT AND COMPOSITIONS CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2011/013615
Kind Code:
A1
Abstract:
Provided is a fluorine-containing compound represented by general formula (1), which exhibits an excellent surface tension lowering effect, though the fluorine-containing compound is a low-environment-load type, fluorine-containing material that does not contain a perfluoroalkyl group having a chain length of 8 or longer, said perfluoroalkyl group being causative of problems associated with PFOS and PFOA. Also provided are a fluorine-containing surfactant, compositions containing the fluorine-containing surfactant, and an aqueous resin emulsion and a floor-polishing composition which each contain the fluorine-containing surfactant. Rf1-CpH2p-CH(OH)-CqH2q-NR-CrH2r-(O)n-SO3M (1) In general formula (1), Rf1 is a C1-6 perfluoroalkyl group; p, q and r are each independently an integer of 1 to 6; M is a cationic atom or atomic group; n is 0 or 1; and R is a hydrogen atom, a C1-12 alkyl group, or a group represented by general formula (2): Rf2-CsH2s-CH(OH)-CtH2t- (2) (wherein Rf2 is a C1-6 perfluoroalkyl group; and s and t are each independently an integer of 1 to 6).

Inventors:
TSUGITA KATSUYUKI (JP)
MITSUHASHI MASATO (JP)
Application Number:
PCT/JP2010/062517
Publication Date:
February 03, 2011
Filing Date:
July 26, 2010
Export Citation:
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Assignee:
AGC SEIMI CHEMICAL CO LTD (JP)
TSUGITA KATSUYUKI (JP)
MITSUHASHI MASATO (JP)
International Classes:
C07C305/04; C07C309/14; C09K3/00; C09K23/00; C09K23/04; C09K23/16; C09K23/38
Foreign References:
JPH0848655A1996-02-20
JPH05345732A1993-12-27
JPS61100266A1986-05-19
JPH10218854A1998-08-18
JPH11310789A1999-11-09
JP2002090937A2002-03-27
JPH07173034A1995-07-11
JPH038A1991-01-07
Other References:
TENSIDE SURFACTANTS DETERGENTS, vol. 29, no. 5, 1992, pages 337 - 341, XP002557949
Attorney, Agent or Firm:
WATANABE Mochitoshi et al. (JP)
Mochitoshi Watanabe (JP)
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