Title:
FLUORINE-CONTAINING COPOLYMER, METHOD FOR PRODUCING SAME AND RESIST COMPOSITION CONTAINING SAME
Document Type and Number:
WIPO Patent Application WO/2005/108446
Kind Code:
A1
Abstract:
Disclosed is a fluorine-containing copolymer having a unit derived from a monomer unit formed by ring-forming polymerization of a fluorine-containing diene represented by the formula (1) below, and a unit derived from a monomer unit formed by ring-forming polymerization of a functional group-containing fluorine-containing diene having a specific structure or a monomer unit formed by polymerization of an acrylic monomer having a specific structure. Also disclosed are a method for producing such a fluorine-containing copolymer and a resist composition containing such a fluorine-containing polymer. CF2=CFCH2CH(C(CF3)2(OR3))CH2CR1=CHR2 (1) In the formula (1), R1 and R2 independently represent a hydrogen atom or an alkyl group having not more than 12 carbon atoms; R3 represents a hydrogen atom, an alkyl group having not more than 20 carbon atoms, an alkoxycarbonyl group having not more than 15 carbon atoms or CH2R4 (wherein R4 represents an alkoxycarbonyl group having not more than 15 carbon atoms); and a part of or all of the hydrogen atoms in the alkyl group, alkoxycarbonyl group or R4 constituting R3 may be substituted with fluorine atoms and the alkyl group, alkoxycarbonyl group or R4 constituting R3 may have an ether oxygen atom.
Inventors:
EDA MASATAKA (JP)
TAKEBE YOKO (JP)
YOKOKOJI OSAMU (JP)
TAKEBE YOKO (JP)
YOKOKOJI OSAMU (JP)
Application Number:
PCT/JP2005/008361
Publication Date:
November 17, 2005
Filing Date:
May 06, 2005
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
EDA MASATAKA (JP)
TAKEBE YOKO (JP)
YOKOKOJI OSAMU (JP)
EDA MASATAKA (JP)
TAKEBE YOKO (JP)
YOKOKOJI OSAMU (JP)
International Classes:
C08F214/18; C08F220/10; C08F236/20; C08L47/00; G03F7/039; H01L21/027; (IPC1-7): C08F236/20; C08F220/10; C08L47/00; G03F7/039; H01L21/027
Domestic Patent References:
| WO2002065212A1 | 2002-08-22 | |||
| WO2002064648A1 | 2002-08-22 | |||
| WO2005012372A1 | 2005-02-10 | |||
| WO2005042453A1 | 2005-05-12 |
Foreign References:
| JP2003255540A | 2003-09-10 |
Other References:
YOKO T. ET AL.: "A new monocyclic fluoropolymer structure for 157-nm photoresists. Proceedings of SPIE-The International Society for Optical Engineering.", RESIST TECHNOLOGY AND PROCESSING XXI, 2004, pages 151 - 158, XP002990841
Attorney, Agent or Firm:
Senmyo, Kenji (38 Kanda-Higashimatsushitach, Chiyoda-ku Tokyo 42, JP)
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