Title:
FLUORINE-CONTAINING CYCLIC COMPOUND, FLUORINE-CONTAINING POLYMER COMPOUND, RESIST MATERIAL USING SAME AND METHOD FOR FORMING PATTERN
Document Type and Number:
WIPO Patent Application WO/2005/080306
Kind Code:
A1
Abstract:
Disclosed is a fluorine-containing cyclic compound represented by the general formula (1) below. R1a represents a cyclic alkyl group having 1-25 carbon atoms, a cyclic alkenyl group or a cyclic alkynyl group; and R2 and R3 independently represent a hydrogen atom, a halogen atom or a straight-chain, branched-chain or cyclic alkyl group having 1-25 carbon atoms. R1a, R2 and R3 may independently include a fluorine atom, an oxygen atom, a sulfur atom, a nitrogen atom or an atomic group having a carbon-carbon double bond.
Inventors:
KOMORIYA HARUHIKO
SUMIDA SHINICHI
OOTANI MICHITAKA
KOMATA TAKEO
MAEDA KAZUHIKO
SUMIDA SHINICHI
OOTANI MICHITAKA
KOMATA TAKEO
MAEDA KAZUHIKO
Application Number:
PCT/JP2005/002400
Publication Date:
September 01, 2005
Filing Date:
February 17, 2005
Export Citation:
Assignee:
CENTRAL GLASS CO LTD (JP)
KOMORIYA HARUHIKO
SUMIDA SHINICHI
OOTANI MICHITAKA
KOMATA TAKEO
MAEDA KAZUHIKO
KOMORIYA HARUHIKO
SUMIDA SHINICHI
OOTANI MICHITAKA
KOMATA TAKEO
MAEDA KAZUHIKO
International Classes:
C07C31/44; C07C33/05; C07C33/44; C07C49/323; C07C49/337; C07C49/345; C07C49/573; C07C69/003; G03F7/039; C07C69/653; C08F14/18; C08F16/26; C08F20/22; C08F32/04; H01L21/027; (IPC1-7): C07C49/573; C07C31/44; C07C33/44; C07C49/507; C07C69/54; C08F16/24; C08F20/28; C08F32/00
Foreign References:
| JP2004046098A | 2004-02-12 | |||
| JP2004004576A | 2004-01-08 | |||
| JP2004004226A | 2004-01-08 | |||
| JP2003238620A | 2003-08-27 |
Other References:
BURGER K. ET AL: "Synthese von 4,4-Bis(trifluormethyl)-1-oxabuta-1,3-dienen.", JOURNAL OF FUER PRAKTISCHE CHEMIE-ZEITUNG., vol. 334, no. 3, 1992, pages 219 - 226, XP002989580
Attorney, Agent or Firm:
Hashimoto, Takeshi c/o Shiga, Patent Office (Ekisaikai Bldg. 1-29, Akashi-cho, Chuo-k, Tokyo 44, JP)
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