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Title:
FLUORINE-CONTAINING ETHER COMPOUND, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, METHOD FOR PRODUCING ARTICLE, AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND
Document Type and Number:
WIPO Patent Application WO/2020/162371
Kind Code:
A1
Abstract:
The present invention provides: a fluorine-containing ether compound that has excellent chemical resistance; a fluorine-containing ether composition; a coating liquid; an article having a surface layer that has excellent chemical resistance; a method for producing this article; and a method which is capable of producing a fluorine-containing ether compound that has excellent chemical resistance. A fluorine-containing ether compound which has a first partial structure that is represented by formula (1) and a second partial structure that is represented by formula (2), and which is configured to comprise five or more first partial structures or alternatively, two or more second partial structures. (1): -ORf12- (2): -ORf13- In the formulae, Rf12 represents a fluoroalkylene group having 1-6 carbon atoms; and Rf13 represents a group which has a fluorine-containing ring structure, and which may have a heteroatom.

Inventors:
AOYAMA MOTOSHI (JP)
Application Number:
JP2020/003794
Publication Date:
August 13, 2020
Filing Date:
January 31, 2020
Export Citation:
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Assignee:
AGC INC (JP)
International Classes:
C07C41/30; C07C43/196; C07C69/63; C07C235/06; C07F7/18; C08G65/336; C09D5/16; C09D171/08; C09K3/18
Domestic Patent References:
WO2017038830A12017-03-09
WO2017187775A12017-11-02
Foreign References:
JPH04500388A1992-01-23
JPH01157932A1989-06-21
JPH04500364A1992-01-23
JPS5759822A1982-04-10
Attorney, Agent or Firm:
T.S. PARTNERS et al. (JP)
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