Title:
FLUORINE-CONTAINING ETHER COMPOUND, LUBRICANT FOR MAGNETIC RECORDING MEDIUM, AND MAGNETIC RECORDING MEDIUM
Document Type and Number:
WIPO Patent Application WO/2023/276954
Kind Code:
A1
Abstract:
Provided is a fluorine-containing ether compound that has excellent abrasion resistance even when the thickness thereof is low, and that can form a lubrication layer in which a reduction in film thickness caused by spin-off is unlikely to occur. This fluorine-containing ether compound is represented by the following formula: R1-R2-O-CH2-R3-CH2-O-R4-R5 (R3 represents a perfluoropolyether chain. R1 and R5 each represent either an alkyl group optionally having a substituent group, or a hydrocarbon group having a double bond or a triple bond. R2 and R4 each represent a divalent linkage group having one or more heteroatoms, each have one or more polar groups, and respectively have a heteroatom at the outermost terminal on the side where a bond is formed with R1 and R5. At least one of R2 or R4 includes one or more secondary amine structures. At least one of R1-R2- or -R4-R5 has one or more cyano groups.)
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| WO/1999/026917 | METHOD FOR HYDROGENATING DINITRILES |
Inventors:
NANKO MASAKI (JP)
Application Number:
PCT/JP2022/025579
Publication Date:
January 05, 2023
Filing Date:
June 27, 2022
Export Citation:
Assignee:
SHOWA DENKO KK (JP)
International Classes:
C07C255/24; C08G65/28; C10M105/54; C10M107/38; G11B5/725
Domestic Patent References:
| WO2021054202A1 | 2021-03-25 | |||
| WO2019039265A1 | 2019-02-28 | |||
| WO2019039200A1 | 2019-02-28 | |||
| WO2021229338A1 | 2021-11-18 |
Foreign References:
| JP2022024373A | 2022-02-09 |
Attorney, Agent or Firm:
OIKAWA Shu et al. (JP)
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