Title:
FLUORINE-CONTAINING ETHER COMPOUND AND PRODUCTION METHOD THEREFOR, COMPOUND AND PRODUCTION METHOD THEREFOR, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, AND ARTICLE AND PRODUCTION METHODS THEREFOR
Document Type and Number:
WIPO Patent Application WO/2021/182166
Kind Code:
A1
Abstract:
Provided are: a fluorine-containing ether compound, a fluorine-containing ether composition, and a coating liquid that are capable of forming a surface layer having excellent durability; and an article that has a surface layer having excellent durability. The present invention provides a fluorine-containing ether compound represented by formula (A1) or formula (A2). Formula (A1): RfO-(Rf1O)m-R1-L1-R2-Q1(-T)n Formula (A2): (T-)nQ1-R2-L1-R1-O-(Rf1O)m-R1-L1-R2-Q1(-T)n In the formulae, each symbol is as defined in the description.
Inventors:
TAKASHITA RYUTA (JP)
WATANABE KOKI (JP)
WATANABE KOKI (JP)
Application Number:
PCT/JP2021/007810
Publication Date:
September 16, 2021
Filing Date:
March 02, 2021
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C08G65/336; B05D7/24; C07F7/18; C09D5/16; C09D7/63; C09K3/00
Domestic Patent References:
| WO2018159641A1 | 2018-09-07 | |||
| WO2004035656A1 | 2004-04-29 | |||
| WO2015022871A1 | 2015-02-19 | |||
| WO2020111009A1 | 2020-06-04 |
Attorney, Agent or Firm:
IEIRI Takeshi (JP)
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