Title:
FLUORINE-CONTAINING ETHER COMPOUND, SURFACE TREATMENT AGENT, FLUORINE-CONTAINING ETHER COMPOSITION, COATING LIQUID, ARTICLE, METHOD FOR PRODUCING ARTICLE, AND COMPOUND
Document Type and Number:
WIPO Patent Application WO/2022/186269
Kind Code:
A1
Abstract:
The present invention provides: a fluorine-containing ether compound which has excellent light resistance; a surface treatment agent; a fluorine-containing ether composition; a coating liquid; an article having a surface layer that has excellent light resistance; a method for producing this article; and a compound which is useful as a starting material for a fluorine-containing ether compound that has excellent light resistance. A fluorine-containing ether compound which is represented by general formula (A). Formula (A): (R1R2C=CR3-L1-)n1Q1-Rf-Q2(-T)n2
(In formula (A), the symbols are as defined in the description.)
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Inventors:
AOYAMA MOTOSHI (JP)
UNO MAKOTO (JP)
UNO MAKOTO (JP)
Application Number:
PCT/JP2022/008843
Publication Date:
September 09, 2022
Filing Date:
March 02, 2022
Export Citation:
Assignee:
AGC INC (JP)
International Classes:
C07C235/06; C07F7/18; C08G65/336; C09K3/18
Domestic Patent References:
| WO2019049754A1 | 2019-03-14 | |||
| WO2019039083A1 | 2019-02-28 |
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Attorney, Agent or Firm:
IEIRI Takeshi (JP)
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