FLUORINE-CONTAINING MONOMER, FLUORINE-CONTAINING POLYMER, PATTERN FORMING COMPOSITION USING SAME, AND PATTERN FORMING METHOD OF SAME

WIPO Patent Application WO/2018/225549

A1

Provided is a fluorine-containing polymer which does not contain a perfluoroalkyl group having 4 or more carbon atoms, and which serves as a pattern forming material that enables the achievement of a pattern having high sensitivity and high resolution, said pattern forming material exhibiting water repellency after being formed into a film together with a photoacid generator, while exhibiting hydrophilicity by means of light irradiation and an acid. A fluorine-containing polymer according to the present invention is characterized by containing a repeating unit represented by formula (1). (In the formula, R1 represents a hydrogen atom, a fluorine atom or an alkyl group having 1-10 carbon atoms; each of R2-R5 represents a hydrogen atom or an alkyl group having 1-10 carbon atoms; X represents a single bond or a divalent group; Y represents a fluorine-containing alkyl group having 1-3 carbon atoms or a carboxylic acid ester group (-COOR); R represents a fluorine-containing alkyl group having 1-3 carbon atoms; and 7 or less hydrogen atoms contained in these groups may be substituted by fluorine atoms.)

JPH02163176	USE OF ACRYLIC COPOLYMER AS ADDITIVE TO AQUEOUS ANIONIC COATING MATERIAL
WO/1990/007528	POLYMER COMPOSITIONS

KANEKO YUZURU (JP)
ITAKURA TSUBASA (JP)
NADANO RYO (JP)

PCT/JP2018/020270

December 13, 2018

May 28, 2018

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CENTRAL GLASS CO LTD (JP)

C08F20/22; C07D307/20; C07D307/24; G03F7/004; G03F7/039; G03F7/20

JP2013033262A	2013-02-14
JP2005206587A	2005-08-04
JPS501004B1	1975-01-14

KOBAYASHI, Hiromichi et al. (JP)

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