Title:
FLUORORESIN WITH LOW FLUORINE-CONTAINING EMULSIFIER RESIDUAL AND METHOD FOR PRODUCING SAME
Document Type and Number:
WIPO Patent Application WO/2007/049517
Kind Code:
A1
Abstract:
Disclosed is a fluororesin substantially containing no perfluorooctanoic acid or salt thereof, wherein the residual amount of a fluorine-containing emulsifier is low. Specifically disclosed is a fluororesin obtained by emulsion-polymerizing a fluorine-containing monomer in an aqueous medium containing a fluorine-containing emulsifier represented by the general formula (1) below, and agglutinating and then drying the resulting aqueous emulsion. In this fluororesin, the residual amount of the fluorine-containing emulsifier represented by the general formula (1) is not more than 10 ppm. XCF2CF2(O)mCF2CF2OCF2COOA (1) (In the formula, X represents a hydrogen atom or a fluorine atom; A represents a hydrogen atom, an alkali metal or NH4; and m represents an integer of 0-1.)
Inventors:
MATSUOKA YASUHIKO (JP)
HIGUCHI SHINYA (JP)
HOSHIKAWA JUN (JP)
KAMIYA HIROKI (JP)
HIGUCHI SHINYA (JP)
HOSHIKAWA JUN (JP)
KAMIYA HIROKI (JP)
Application Number:
PCT/JP2006/320942
Publication Date:
May 03, 2007
Filing Date:
October 20, 2006
Export Citation:
Assignee:
ASAHI GLASS CO LTD (JP)
MATSUOKA YASUHIKO (JP)
HIGUCHI SHINYA (JP)
HOSHIKAWA JUN (JP)
KAMIYA HIROKI (JP)
MATSUOKA YASUHIKO (JP)
HIGUCHI SHINYA (JP)
HOSHIKAWA JUN (JP)
KAMIYA HIROKI (JP)
International Classes:
C08F6/16; C08F2/26; C08F14/26
Domestic Patent References:
WO2005007709A1 | 2005-01-27 | |||
WO2005042593A1 | 2005-05-12 |
Foreign References:
JP2006321797A | 2006-11-30 | |||
JP2006274237A | 2006-10-12 | |||
JP2003119204A | 2003-04-23 | |||
JP2005290350A | 2005-10-20 | |||
JP2002532583A | 2002-10-02 | |||
JP2002308914A | 2002-10-23 | |||
JPH06192321A | 1994-07-12 | |||
JP2003082019A | 2003-03-19 | |||
JP2003119204A | 2003-04-23 | |||
JP2005310828A | 2005-11-04 |
Other References:
See also references of EP 1942118A4
Attorney, Agent or Firm:
SENMYO, Kenji et al. (38 Kanda-Higashimatsushitacho, Chiyoda-k, Tokyo42, JP)
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