Title:
FOREIGN MATTER DETECTOR/ANALYZER AND METHOD THEREOF
Document Type and Number:
WIPO Patent Application WO/1997/028422
Kind Code:
A1
Abstract:
A laser beam from a projector (51) having a beam spot of 1,000 x 40 'mu'm scans a wafer (12), and the positions of foreign matter is detected and stored by a scatter detector (35). When a portion near this stored position is scanned by a laser beam having a beam spot of 10 'mu'm from a projector (52) and any foreign matter is detected, the range of the beam spot is scanned by a pitch of 1 'mu'm. The position at which the output from the scatter detector becomes maximal is defined as the position of a foreign matter. A range of 1 x 1 'mu'm having the center thereof at the defined position is scanned by an electron beam of 0.1 'mu'm, and the resulting X-rays are detected and the composition is analyzed. The electron beam and the laser beam are arranged in such a manner as to radiate the same point while the wafer (12) is fixed.
Inventors:
KANOU EIJI (JP)
KIDO TAKASHI (JP)
MAEDA YASUHIRO (JP)
HONMA KOUJI (JP)
TSUCHIYA MASAYOSHI (JP)
KIDO TAKASHI (JP)
MAEDA YASUHIRO (JP)
HONMA KOUJI (JP)
TSUCHIYA MASAYOSHI (JP)
Application Number:
PCT/JP1997/000244
Publication Date:
August 07, 1997
Filing Date:
January 31, 1997
Export Citation:
Assignee:
ADVANTEST CORP (JP)
KANOU EIJI (JP)
KIDO TAKASHI (JP)
MAEDA YASUHIRO (JP)
HONMA KOUJI (JP)
TSUCHIYA MASAYOSHI (JP)
KANOU EIJI (JP)
KIDO TAKASHI (JP)
MAEDA YASUHIRO (JP)
HONMA KOUJI (JP)
TSUCHIYA MASAYOSHI (JP)
International Classes:
G01N21/95; (IPC1-7): G01B11/30; G01N21/88; G01N23/225
Foreign References:
| JPH0636016A | 1994-02-10 | |||
| JPS6196644A | 1986-05-15 | |||
| JPS625547A | 1987-01-12 |
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