Title:
FOREIGN MATTER REMOVAL DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/217252
Kind Code:
A1
Abstract:
A foreign matter removal device (100) is provided with a nozzle (31) for expanding a pressurized stream of liquid carbon dioxide and forming dry ice particles in the stream due to cooling during the expansion, a chamber (29) which is connected to the nozzle (31) and into which solid carbon dioxide particles flow, a slit (23) that is connected to the chamber (29) and ejects the dry ice particles towards the surface of a substrate (13), and a suction port (24) arranged adjacent to the slit (23), wherein the gap between the nozzle (31) and the chamber (29) is changed to adjust the particle size of the dry ice particles being ejected from the slit (23). Due to this configuration, fine foreign matter is removed while damage to the substrate or a semiconductor die is curbed.
Inventors:
NAKAMURA TOMONORI (JP)
OMATA HIROSHI (JP)
OMATA HIROSHI (JP)
Application Number:
PCT/JP2017/020553
Publication Date:
December 21, 2017
Filing Date:
June 02, 2017
Export Citation:
Assignee:
SHINKAWA KK (JP)
International Classes:
H01L21/304; B08B5/02; B08B7/00
Domestic Patent References:
WO2014076794A1 | 2014-05-22 |
Foreign References:
JP2011167822A | 2011-09-01 | |||
JP2009099772A | 2009-05-07 |
Attorney, Agent or Firm:
YKI PATENT ATTORNEYS (JP)
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