FORMING A MARK ON A GEMSTONE OR INDUSTRIAL DIAMOND

WIPO Patent Application WO2002066262

A3

To form a micro mark on the table (7a) of a diamond (7), a holder or dop (11) with the diamond (7) is spun, a photo resist is applied to the table (7a), the resist is baked by heating the base of the dop (11), and the dop (11) is transferred to the table (30) of apparatus for exposing the resist. The resist is exposed using an exposure radiation with a pattern which is a reduced image of a mask (35), working through an objective lens (38). The exposure radiation is projected by a radiation source (31) and can be 350 to 450 nm. In order to locate, orientate and focus the image, the radiation source (31) is arranged to project light in the wavelength range 500 to 550 nm, which does not affect the resist, forming a setting-up image on the table (7a). the setting-up image is viewed in an observation plane (44) through the objective lens (38) and a beam splitter (36). After exposure, the resist is developed and the exposed area of the table (7a) is then milled using a plasma.

SMITH JAMES GORDON CHARTERS (GB)
GUY KEITH BARRY (GB)

PCT/GB2002/000709

June 26, 2003

February 18, 2002

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GERSAN ETS (LI)
SMITH JAMES GORDON CHARTERS (GB)
GUY KEITH BARRY (GB)

A44C17/00; B23K26/03; B28D5/00; B44B3/02; B44B3/06; B44B5/02; B44C1/22; A44C27/00; C04B41/53; C04B41/91; G03F7/20; (IPC1-7): B44C1/00; B44C1/22; C04B41/00; B28D5/00; B23K26/03; C04B41/53; B23K26/06

WO1997003846A1	1997-02-06
WO1998052773A1	1998-11-26
WO2000076583A1	2000-12-21
WO1992009876A2	1992-06-11

US5573684A	1996-11-12
DE4439714A1	1996-05-15
US4478677A	1984-10-23
DE2702176A1	1977-07-28
US5410125A	1995-04-25

See also references of EP 1361961A2

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