FRAME, EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM, AND METHOD FOR MANUFACTURING DEVICE

WIPO Patent Application WO/2019/175964

A1

This frame (110) is provided with the following: A. a frame body (111) having a holding part (130) which detachably holds a target generation device (12) for outputting a target material into a chamber (10) as droplets, the target material being a target material for generating extreme ultraviolet light; B. a target position adjustment part which is provided in the holding part and adjusts the relative position of the target generation device with respect to the chamber; and C. a moving mechanism (42) that moves the frame body at least in the horizontal direction. The target position adjustment part is a stage (18) that moves the target generation device in two directions perpendicular to the injection axis of the droplets.

JP2000112145	DEVELOPER FOR PHOTORESIST FOR EXCIMER LASER, DEVELOPING METHOD OF PHOTORESIST FOR EXCIMER LASER AND DEVELOPING METHOD OF PHOTORESIST
WO/2019/064585	SUBSTRATE HANDLING DEVICE, EXPOSURE DEVICE, METHOD FOR PRODUCING FLAT PANEL DISPLAY, DEVICE PRODUCTION METHOD, SUBSTRATE HANDLING METHOD, AND EXPOSURE METHOD
JPH11282172	LIGHTING OPTICAL DEVICE AND EXPOSURE DEVICE

NISHISAKA TOSHIHIRO (JP)

PCT/JP2018/009728

September 19, 2019

March 13, 2018

Click for automatic bibliography generation  

GIGAPHOTON INC (JP)

G03F7/20; G21K5/08; H05G2/00

WO2016171158A1

2016-10-27

JP2001350000A	2001-12-21
JP2013175431A	2013-09-05
JP2013069655A	2013-04-18
JP2010080941A	2010-04-08
JP2011029587A	2011-02-10
JP2014010954A	2014-01-20

MATSUURA Kenzo (JP)

View/Download PDF      PDF Help

Previous Patent: FILM FORMATION MASK AND METHOD FOR MANUFACTURING DISPLAY DEVICE USING SAME

Next Patent: REFRIGERATOR