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Title:
FREE RADICAL SCAVENGING HYDROGEN SOLUTION, AND METHOD AND APPARATUS FOR PRODUCING THE SAME
Document Type and Number:
WIPO Patent Application WO/2007/116889
Kind Code:
A1
Abstract:
A liquid material is produced which exhibits free radical scavenging and reducing properties without sacrificing pH from a stock liquid material and can be used, for example, in beverages, foods, medicaments, and cosmetic preparations. Specifically, this invention provides an apparatus for producing a free radical scavenging hydrogen solution, a method for producing the same, and a free radical scavenging hydrogen solution produced using the production apparatus. The production apparatus is characterized by comprising a hydrogen solution production apparatus (102), a free radical scavenging capability providing apparatus (5), a control unit (6), a free radical scavenging stabilization apparatus (7), and a storage tank (8). The hydrogen solution production apparatus (102) comprises a vortex flow ejector apparatus (3) and a bubble size-reducing apparatus (4) for breaking bubbles to produce a hydrogen solution. The vortex flow ejector apparatus (3) communicates a pump device (1) with a hydrogen supply device (2) and produces a suspension of bubbles in a hydrogen saturated solution. The free radical scavenging capability providing apparatus (5) comprises for magnetically treating a hydrogen solution by taking advantage of a rotational magnetic field formed by the rotation of a magnet of 0.01 to 10 tesla at a speed of 1000 to 3500 rpm.

Inventors:
KAMIMURA CHIKASHI (JP)
OHBA RIICHIRO (JP)
MATSUI HISAKAZU (JP)
KATAYOSE YOSHIHITO (JP)
KAMIMURA TAKASHI (JP)
Application Number:
PCT/JP2007/057489
Publication Date:
October 18, 2007
Filing Date:
April 03, 2007
Export Citation:
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Assignee:
YUUGEN KAISYA JOHO KAGAKU KENK (JP)
KAMIMURA CHIKASHI (JP)
OHBA RIICHIRO (JP)
MATSUI HISAKAZU (JP)
KATAYOSE YOSHIHITO (JP)
KAMIMURA TAKASHI (JP)
International Classes:
C02F1/68; B01F1/00; B01F3/04; B01F5/00; B01F5/04; C02F1/34; C02F1/48
Foreign References:
JP2003088736A2003-03-25
JP2004122088A2004-04-22
Attorney, Agent or Firm:
KYOSEI INTERNATIONAL PATENT OFFICE (8-14 Akasaka 3-chom, Minato-ku Tokyo 52, JP)
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