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Patent Searching and Data


Title:
FULLERENE DERIVATIVE, PROCESS FOR PRODUCTION OF SAME, AND ALLERGEN ADSORBENT COMPRISING SAME
Document Type and Number:
WIPO Patent Application WO/2011/096349
Kind Code:
A1
Abstract:
Disclosed are: a novel fullerene derivative which can adsorb an allergen that causes hay fever within a short time and with high efficiency and does not re-release the allergen, and which does not contain a metal or the like that has any adverse influence on human bodies, and can be applied onto, can penetrate into or can be chemically bound to surfaces of various materials readily; and a process for producing the fullerene derivative. The fullerene derivative is characterized in that a halogen group and many hydroxy groups are bound directly to a fullerene core. When the halogen group is a chlorine, the derivative can be synthesized by the partial hydroxylation of a chlorinated fullerene or the partial chlorination of a hydroxylated fullerene.

Inventors:
KOKUBO Ken (Yamadaoka Suita-shi Osaka, 71, 〒5650871, JP)
小久保 研 (〒71 大阪府吹田市山田丘1番1号 国立大学法人大阪大学内 Osaka, 〒5650871, JP)
Application Number:
JP2011/051864
Publication Date:
August 11, 2011
Filing Date:
January 31, 2011
Export Citation:
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Assignee:
OSAKA UNIVERSITY (1-1 Yamadaoka, Suita-shi Osaka, 71, 〒5650871, JP)
国立大学法人大阪大学 (〒71 大阪府吹田市山田丘1番1号 Osaka, 〒5650871, JP)
TOTAI Co. Ltd. (24-17, Ueno 5-chome Taito-ku Tokyo, 05, 〒1100005, JP)
東タイ株式会社 (〒05 東京都台東区上野5丁目24番17号 Tokyo, 〒1100005, JP)
International Classes:
C01B31/02; C07C25/22; C07C39/12; C07C39/40
Attorney, Agent or Firm:
MINAKA Eiji et al. (MINAKA INTERNATIONAL PATENT OFFICE 25-12, Asakusabashi 5-chome Taito-ku Tokyo, 53, 〒1110053, JP)
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Claims: