Title:
GADOLINIUM SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE TARGET
Document Type and Number:
WIPO Patent Application WO/2011/078148
Kind Code:
A1
Abstract:
Disclosed is an assembled body of a gadolinium target and a titanium backing plate, which has a solid-state diffusion-bonded interface on the bonding interface between the gadolinium target and the titanium backing plate. Generation of warping of the target material and the backing plate and peeling of the target material and the backing plate from each other are eliminated by providing the backing plate suitable for the gadolinium sputtering target, searching optimum bonding conditions, improving the film-forming speed, and stabilizing sputtering, and increasing the bonding strength between the target material and the backing plate, and generation of particles when performing the sputtering is suppressed.
Inventors:
TSUKAMOTO Shiro (187-4 Usuba, Hanakawa-cho, Kitaibaraki-sh, Ibaraki 35, 〒3191535, JP)
Application Number:
JP2010/072965
Publication Date:
June 30, 2011
Filing Date:
December 21, 2010
Export Citation:
Assignee:
JX Nippon Mining & Metals Corporation (6-3 Otemachi 2-chome, Chiyoda-ku Tokyo, 64, 〒1008164, JP)
ＪＸ日鉱日石金属株式会社 (〒64 東京都千代田区大手町二丁目６番３号 Tokyo, 〒1008164, JP)
ＪＸ日鉱日石金属株式会社 (〒64 東京都千代田区大手町二丁目６番３号 Tokyo, 〒1008164, JP)
International Classes:
C23C14/34; B23K20/00
Attorney, Agent or Firm:
OGOSHI Isamu (OGOSHI International Patent Office, Daini-Toranomon Denki Bldg. 5F,1-10, Toranomon 3-chom, Minato-ku Tokyo 01, 〒1050001, JP)
Download PDF: