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Title:
GAS ADSORBING MATERIAL, PRECURSOR OF THE GAS ADSORBING MATERIAL, AND PROCESS FOR PRODUCING GAS ADSORBING MATERIAL
Document Type and Number:
WIPO Patent Application WO/2010/035561
Kind Code:
A1
Abstract:
Disclosed is a gas adsorbing material having a three-dimensional structure.  The three-dimensional structure comprises an aromatic ring as a main skeleton.  A ligand (p-hydroxybenzoic acid) containing a carboxyl group and a functional group that is other than a carboxyl group and can form a coordinate bond, and a metal nucleus (Zn) are bonded at a ratio of 1 : 1 to the main skeleton to constitute a basic skeleton.  In the gas adsorbing material, the ligand contains a hydroxy group as the functional group other than the carboxyl group, and the carboxyl group and the functional group other than the carboxyl group are bonded respectively to at least one site of the metal nucleus to constitute the three-dimensional structure.  The gas adsorbing material is obtained by reacting the ligand with the metal nucleus to obtain a precursor, drying the precursor, dissolving the dried precursor in an organic solvent (acetone), heating and stirring the solution to form a three-dimensional structure with the organic solvent incorporated therein as a crystallization solvent, and then removing the crystallization solvent.

Inventors:
FURUKAWA, Masahiro (2-56, Suda-cho, Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
古川 昌宏 (〒30 愛知県名古屋市瑞穂区須田町2番56号 日本碍子株式会社内 Aichi, 〒4678530, JP)
Application Number:
JP2009/061760
Publication Date:
April 01, 2010
Filing Date:
June 26, 2009
Export Citation:
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Assignee:
NGK INSULATORS, LTD. (2-56, Suda-cho Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
日本碍子株式会社 (〒30 愛知県名古屋市瑞穂区須田町2番56号 Aichi, 〒4678530, JP)
FURUKAWA, Masahiro (2-56, Suda-cho, Mizuho-ku, Nagoya-cit, Aichi 30, 〒4678530, JP)
International Classes:
B01J20/22; C07C65/03; C07F3/06
Attorney, Agent or Firm:
ITEC INTERNATIONAL PATENT FIRM (Pola-Nagoya Bldg, 9-26 Sakae 2-chome, Naka-k, Nagoya-shi Aichi 08, 〒4600008, JP)
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