GAS ANALYSIS DEVICE AND CONTAMINATION DETECTION METHOD USED IN SAME

Title:

GAS ANALYSIS DEVICE AND CONTAMINATION DETECTION METHOD USED IN SAME

Document Type and Number:

WIPO Patent Application WO/2013/035675

Kind Code:

A1

Abstract:

A gas analysis device that, in order to be capable of detecting with good sensitivity adsorbent gas even if there is a small amount of contamination that has a large impact during adsorbent gas measurement, comprises: a gas injection mechanism (3) that injects adsorbent injection gas into a flow path (11) wherein a sample gas flows; a gas measurement mechanism (21) capable of measuring values relating to the amount of adsorbent gas flowing in the flow path (11); and a contamination determination unit (41) that determines contamination in the flow path, on the basis of values relating to adsorbent gas measurement response speed by the gas measurement mechanism (21).

Inventors:

ITAYA TAKAHIRO (JP)
NAKATANI SHIGERU (JP)

Application Number:

PCT/JP2012/072379

Publication Date:

March 14, 2013

Filing Date:

September 03, 2012

Export Citation:

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Assignee:

HORIBA LTD (JP)
ITAYA TAKAHIRO (JP)
NAKATANI SHIGERU (JP)

International Classes:

G01N1/00; G01N1/22; G01N21/03; G01N21/15; G01N21/35; G01N31/00

Foreign References:

JP2003014634A	2003-01-15
JP2002310910A	2002-10-23
JP2010060557A	2010-03-18
JPH07333114A	1995-12-22
JPS5773648A	1982-05-08
JPH11295293A	1999-10-29
JP2002310910A	2002-10-23

Other References: