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Patent Searching and Data


Title:
GAS ANALYSIS DEVICE, CONTROL SYSTEM AND CONTROL ASSISTANCE SYSTEM FOR COMBUSTION EQUIPMENT, AND GAS ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2016/157610
Kind Code:
A1
Abstract:
A gas analysis device is provided with: a measurement unit that uses a plurality of measurement passes to measure the absorption amount of laser light including an absorption wavelength corresponding to at least two electron level transitions in the same component included in a combustion gas within a combustion furnace; a standard setting unit that sets a standard gas concentration distribution and a standard temperature distribution; and an analysis unit that determines a gas concentration distribution and a temperature distribution by solving a two-dimensional distribution function in which the gas concentration distribution and the temperature distribution are included as variables such that the minimum deviation between the actual measured absorption amount and a standard absorption amount is achieved.

Inventors:
OKA HIROTAKA (JP)
NISHIMIYA TATSUYUKI (JP)
KAWAZOE KOHEI (JP)
Application Number:
PCT/JP2015/083005
Publication Date:
October 06, 2016
Filing Date:
November 25, 2015
Export Citation:
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Assignee:
MITSUBISHI HEAVY IND LTD (JP)
International Classes:
G01N21/39; F23N1/02; F23N5/00; F23N5/08; G01K11/00; G01N21/3504; G01N21/3554
Foreign References:
JP2015040747A2015-03-02
US6271522B12001-08-07
JPS62116225A1987-05-27
JP2011137467A2011-07-14
Other References:
See also references of EP 3246694A4
Attorney, Agent or Firm:
SEISHIN IP PATENT FIRM, P. C. (JP)
誠真 IP patent business corporation (JP)
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