Title:
GAS ANALYSIS DEVICE USING LASER BEAM AND GAS ANALYSIS METHOD
Document Type and Number:
WIPO Patent Application WO/2017/119283
Kind Code:
A1
Abstract:
This gas analysis device is provided with: a laser source which outputs a laser beam; an irradiation unit which irradiates, from multiple directions, a laser beam from the laser source onto a measurement region that contains the gas to be measured; multiple light receivers which receive the laser beam transmitted through the measurement region and output an electric signal corresponding to the intensity of the received laser beam; and an analysis device which, on the basis of the electric signals outputted from the light receivers, analyzes the physical state of the gas to be measured. The analysis device configures a function (for example, a two-dimensional polynomial f(X,Y)) that indicates the physical state (concentration, temperature, etc.) of the gas to be measured at least in the measurement region, and measures the physical state of the gas to be measured by using measurement values obtained from the electric signals outputted from the light receivers to determine the coefficients (ak-i,i) of the terms included in the function.
Inventors:
DEGUCHI YOSHIHIRO (JP)
Application Number:
PCT/JP2016/087949
Publication Date:
July 13, 2017
Filing Date:
December 20, 2016
Export Citation:
Assignee:
UNIV TOKUSHIMA (JP)
International Classes:
G01N21/27; G01N21/3504; G01N21/39
Foreign References:
| JP2010528296A | 2010-08-19 |
Attorney, Agent or Firm:
SAMEJIMA, Mutsumi et al. (JP)
Download PDF: