GAS BARRIER ALUMINUM DEPOSITION FILM AND PREPARATION METHOD THEREOF

Title:

GAS BARRIER ALUMINUM DEPOSITION FILM AND PREPARATION METHOD THEREOF

Document Type and Number:

WIPO Patent Application WO/2021/162203

Kind Code:

A1

Abstract:

A gas barrier aluminum deposition film according to an embodiment of the present invention has a seed coating layer, containing a large amount of one or more functional groups selected from among the hydroxyl group (-OH), amine group (-NH) and carboxylic acid group (-COOH), formed on a thermoplastic plastic base film to form a seed molecular layer which allows uniform deposition of aluminum such as AlOx or AlNx by means of a chemical reaction of vaporized aluminum atoms on the surface of the coating layer during the early part of aluminum deposition, thereby inducing a uniform deposition of an aluminum layer to be deposited thereafter and enabling the deposition film to have excellent oxygen and vapor barrier properties compared to an existing aluminum deposition film.

Inventors:

HAN SEUNG HUN (KR)
KIM KIL JOONG (KR)
CHUNG IN SEEK (KR)

Application Number:

PCT/KR2020/015408

Publication Date:

August 19, 2021

Filing Date:

November 05, 2020

Export Citation:

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Assignee:

TORAY ADVANCED MAT KOREA INC (KR)

International Classes:

C23C14/20; B29C48/00; B29C48/08; B29C48/91; C08J5/18; C08J7/04; C23C14/02; B29K101/12

Foreign References:

KR20130091281A	2013-08-16
JP2000202969A	2000-07-25
KR20150073980A	2015-07-01
JP6413539B2	2018-10-31
KR101457613B1	2014-11-07
KR20040087479A	2004-10-14

Other References: