Title:
GAS-BARRIER BASE MATERIAL, PRODUCTION METHOD THEREFOR, AND ELECTRONIC DEVICE EQUIPPED WITH SUCH BASE MATERIAL
Document Type and Number:
WIPO Patent Application WO/2019/230283
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a gas-barrier base material for which it is possible to employ a wet formation method, such as application, advantageous in terms of cost and productivity, and which has excellent gas barrier properties applicable to electronic devices; a production method for such a gas-barrier base material; and an electronic device equipped with such a gas-barrier base material. The gas-barrier base material according to the present invention at least has a gas-barrier layer disposed on the base material, and is characterized in that: a molecular conversion layer is provided between the base material and the gas-barrier layer; and the molecular conversion layer comprises either a monomer or a polycondensate of an organic metal oxide that releases a fluorinated compound through a reaction with a gas component present in the environment in which said gas-barrier base material is used.
Inventors:
II HIROMOTO (JP)
MAKISHIMA YUKIHIRO (JP)
MAKISHIMA YUKIHIRO (JP)
Application Number:
PCT/JP2019/017667
Publication Date:
December 05, 2019
Filing Date:
April 25, 2019
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; B05D7/24; B32B9/04; H01L21/336; H01L29/786; H01L51/05; H01L51/30; H01L51/44; H01L51/50; H05B33/02; H05B33/04
Domestic Patent References:
| WO2019093459A1 | 2019-05-16 | |||
| WO2019093458A1 | 2019-05-16 |
Foreign References:
| JP2003340955A | 2003-12-02 | |||
| JP2005313461A | 2005-11-10 | |||
| JPH01263158A | 1989-10-19 | |||
| JP2015225785A | 2015-12-14 | |||
| JP2015221757A | 2015-12-10 |
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
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