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Title:
GAS BARRIER FILM, ELECTRONIC DEVICE INCLUDING SAME, GAS BARRIER BAG, AND METHOD FOR MANUFACTURING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2010/113693
Kind Code:
A1
Abstract:
A gas barrier film wherein gas barrier layers (2) in contact with both main surfaces of a plastic film (1) are SiCNFH layers formed by catalyst CVD and satisfy the conditions 0.01

Inventors:
NAKAYAMA HIROSHI (JP)
Application Number:
PCT/JP2010/054930
Publication Date:
October 07, 2010
Filing Date:
March 23, 2010
Export Citation:
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Assignee:
MATERIAL DESIGN FACTORY CO LTD (JP)
NAKAYAMA HIROSHI (JP)
International Classes:
C23C16/42; B32B9/00; B65D65/40; H01L31/042; H01L51/50; H05B33/04
Foreign References:
JP2009502554A2009-01-29
JP2004221275A2004-08-05
JP2007088495A2007-04-05
JP2008155585A2008-07-10
JP2005179693A2005-07-07
JP2002532850A2002-10-02
Other References:
See also references of EP 2415901A4
Attorney, Agent or Firm:
FUKAMI, Hisao et al. (JP)
Hisao Fukami (JP)
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