Title:
GAS BARRIER FILM, ELECTRONIC DEVICE MEMBER, AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2016/171184
Kind Code:
A1
Abstract:
The present invention is: a gas barrier film having a substrate film and a gas barrier layer formed on the substrate film and obtained by reforming a layer containing a polysilazane compound, wherein the gas barrier film is characterized in that the water vapor permeability is 0.100g/(m2•day) or below, and in a 60°C/90% RH argon gas atmosphere the amount of hydrogen gas released from the gas barrier layer is no greater than 5.5 μg/cm2 of the gas barrier film; an electronic device member comprising the gas barrier film; and an electronic device provided with the electronic device member. The present invention provides a gas barrier film having a gas barrier layer which has excellent gas barrier properties and minimal outgassing, an electronic device member comprising the gas barrier film, and an electronic device provided with the electronic device member.
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Inventors:
SUZUKI YUTA (JP)
IWAYA WATARU (JP)
IWAYA WATARU (JP)
Application Number:
PCT/JP2016/062544
Publication Date:
October 27, 2016
Filing Date:
April 20, 2016
Export Citation:
Assignee:
LINTEC CORP (JP)
International Classes:
B32B9/00; B32B27/00; G02F1/1333
Domestic Patent References:
| WO2011007543A1 | 2011-01-20 | |||
| WO2013161809A1 | 2013-10-31 |
Foreign References:
| JP2002222691A | 2002-08-09 | |||
| JP2014240462A | 2014-12-25 |
Other References:
See also references of EP 3287274A4
Attorney, Agent or Firm:
OHISHI HARUHITO (JP)
Haruhito Oishi (JP)
Haruhito Oishi (JP)
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