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Patent Searching and Data


Title:
GAS BARRIER FILM AND ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2017/090591
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing: a gas barrier film which exhibits excellent gas barrier performance even if thin, and excellent bending resistance; and an electronic device which is provided with said gas barrier film. This gas barrier film 1 has a gas barrier layer 3 provided on a substrate 2, and is characterized in that: the gas barrier layer 3 has, in at least the thickness direction, a mixed region including a non-transition metal M1 and a transition metal M2; in the mixed region, the value of the ratio of the atomic ratio of the transition metal M2 to the atomic ratio of the non-transition metal M1 in the thickness direction of the gas barrier layer 3, said atomic ratios being measured using X-ray photoelectron spectroscopy, is in the range of 0.02-49; the region in which the value of the aforementioned ratio is in the aforementioned range continues in the thickness direction of the gas barrier layer 3 to a thickness of at least 3 nm; and the thickness of the gas barrier layer 3 is in the range of 5-1000 nm.

Inventors:
NISHIO SHOJI (JP)
MORI TAKAHIRO (JP)
Application Number:
PCT/JP2016/084568
Publication Date:
June 01, 2017
Filing Date:
November 22, 2016
Export Citation:
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Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; B32B7/02; C23C14/08; C23C14/10; C23C14/20; C23C14/34; H01L51/50; H05B33/10
Foreign References:
JP2004322382A2004-11-18
JP2003013202A2003-01-15
JP2016203431A2016-12-08
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
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