Title:
GAS BARRIER FILM LAMINATE AND ELECTRONIC COMPONENT USING SAME
Document Type and Number:
WIPO Patent Application WO/2015/033850
Kind Code:
A1
Abstract:
The present invention is capable of relaxing residual stress and reducing curling, while maintaining flexibility during the formation of a gas barrier film by a plasma CVD method, and enables achievement of a gas barrier film laminate that has sufficient gas barrier properties. A gas barrier film laminate according to the present invention is provided with: a resin film (11) that serves as a base; and at least one organic film layer (12) and at least one gas barrier film layer (13), that are arranged on at least one surface of the resin film (11). The gas barrier film layer (13) is a film which is formed by a plasma CVD method and which is mainly composed of a metal oxide, while containing an organic component.
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Inventors:
HASHIMOTO MASASHI (JP)
FUJITA ATSUKO (JP)
KUNINOBU TAKAFUMI (JP)
FUJITA ATSUKO (JP)
KUNINOBU TAKAFUMI (JP)
Application Number:
PCT/JP2014/072573
Publication Date:
March 12, 2015
Filing Date:
August 28, 2014
Export Citation:
Assignee:
JNC CORP (JP)
International Classes:
B32B9/00; B32B27/00; C23C16/40; C23C16/42
Domestic Patent References:
| WO2012067186A1 | 2012-05-24 |
Foreign References:
| JP2013086445A | 2013-05-13 | |||
| JP2006044231A | 2006-02-16 | |||
| JP2011116124A | 2011-06-16 | |||
| JP2008235165A | 2008-10-02 | |||
| JP2012097354A | 2012-05-24 |
Attorney, Agent or Firm:
MIYAGAWA, Teiji et al. (JP)
Teiji Miyagawa (JP)
Teiji Miyagawa (JP)
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