Title:
GAS BARRIER FILM LAMINATE AND ELECTRONIC COMPONENT EMPLOYING SAME
Document Type and Number:
WIPO Patent Application WO/2015/190572
Kind Code:
A1
Abstract:
The purpose of the present invention is to obtain a gas barrier film laminate provided with a gas barrier film having satisfactory gas barrier properties, with which the cohesion of the gas barrier layer can be improved during formation of the gas barrier layer by a plasma CVD process. This gas barrier film laminate is provided with: a resin film (11) serving as a base material; a cohesive layer (13) formed on at least one surface side of the resin film (11), the cohesive layer (13) containing a compound the composition of which includes SiOx and which satisfies the expression 1.8 < x < 2.2, or a cohesive layer (13) containing a compound the composition of which includes SiCy and which satisfies the expression 0 < y < 0.15; and a gas barrier layer (14) formed over the cohesive layer (13), the gas barrier layer (14) containing a compound the composition of which includes SiOxCy, and which satisfies the expressions 1.1 ≦ x ≦ 1.9 and 0 ≦ y ≦ 1.9.
Inventors:
KUNINOBU TAKAFUMI (JP)
HASHIMOTO MASASHI (JP)
HICHIRI KEI (JP)
HASHIMOTO MASASHI (JP)
HICHIRI KEI (JP)
Application Number:
PCT/JP2015/066934
Publication Date:
December 17, 2015
Filing Date:
June 11, 2015
Export Citation:
Assignee:
JNC CORP (JP)
International Classes:
B32B9/00; C23C16/42; C23C16/50; H01L31/048; H01L51/50; H05B33/04
Domestic Patent References:
| WO2010093041A1 | 2010-08-19 | |||
| WO2013011872A1 | 2013-01-24 |
Foreign References:
| JP2012193449A | 2012-10-11 | |||
| JP2005290560A | 2005-10-20 |
Attorney, Agent or Firm:
MIYAGAWA, Teiji et al. (JP)
Teiji Miyagawa (JP)
Teiji Miyagawa (JP)
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