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Patent Searching and Data


Title:
GAS BARRIER FILM, AND METHOD FOR MANUFACTURING SAME
Document Type and Number:
WIPO Patent Application WO/2014/104669
Kind Code:
A1
Abstract:
The present invention relates to a gas barrier film including: an inorganic layer which contains oxygen atoms; and an organic-inorganic mixed layer which contains silica (SiO2) formed on one surface of the inorganic layer. The inorganic layer has a first area that is adjacent to the organic-inorganic mixed layer; and a second area that is present below the first area in the thickness direction of the inorganic layer. The number of the oxygen (O) atoms in the first area is greater than the number of the oxygen atoms in the second area which is equal in volume to the first area. The gas barrier film is excellent in terms of gas barrier properties, flexibility, transparency, and crack prevention. In addition, the gas barrier film enables non-vacuum wet coating and is thus advantageous in shortening the manufacturing time.

Inventors:
KANG SE YEONG (KR)
LEE DAE GYU (KR)
KIM BYUNG SOO (KR)
LEE EUN HWA (KR)
KWAK TAEK SOO (KR)
KIM SUNG KOOK (KR)
Application Number:
PCT/KR2013/011970
Publication Date:
July 03, 2014
Filing Date:
December 20, 2013
Export Citation:
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Assignee:
CHEIL IND INC (KR)
International Classes:
B32B9/00; B32B15/08; B32B27/04; G09F9/00
Foreign References:
KR20120031228A2012-03-30
KR20110012581A2011-02-09
KR20120080383A2012-07-17
KR20120078491A2012-07-10
KR100781423B12007-12-03
US20040058157A12004-03-25
Attorney, Agent or Firm:
AJU KIM CHANG & LEE (KR)
특허법인아주양헌 (KR)
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