Title:
GAS BARRIER FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2013/069402
Kind Code:
A1
Abstract:
Provided are: a gas barrier film which has excellent gas barrier properties; and a method for producing such a gas barrier film. A gas barrier film, which is obtained by forming a gas barrier layer on a base, and a method for producing such a gas barrier film, wherein the gas barrier layer contains at least oxygen atoms, silicon atoms and nitrogen atoms. When a surface of the gas barrier layer in contact with the base is referred to as the base side and the opposite surface thereof is referred to as the surface side, the gas barrier surface has a first region wherein the amount of oxygen > the amount of silicon > the amount of nitrogen, a second region wherein the amount of silicon > the amount of oxygen > the amount of nitrogen and a third region wherein the amount of oxygen > the amount of silicon > the amount of nitrogen in this order from the surface side to the base side, said amount of nitrogen, said amount of silicon and said amount of oxygen being determined by an XPS measurement.
Inventors:
NAGANAWA SATOSHI (JP)
SUZUKI YUTA (JP)
SUZUKI YUTA (JP)
Application Number:
PCT/JP2012/076383
Publication Date:
May 16, 2013
Filing Date:
October 12, 2012
Export Citation:
Assignee:
LINTEC CORP (JP)
International Classes:
B32B9/00; C08J7/043; C08J7/044; C08J7/048; C23C14/48
Domestic Patent References:
| WO2010107018A1 | 2010-09-23 | |||
| WO2010021326A1 | 2010-02-25 |
Foreign References:
| JP2009196155A | 2009-09-03 | |||
| JP2007237588A | 2007-09-20 | |||
| JP2011026645A | 2011-02-10 | |||
| JP2010158832A | 2010-07-22 | |||
| JP2009196155A | 2009-09-03 | |||
| JP2001026887A | 2001-01-30 | |||
| JP2001156013A | 2001-06-08 |
Other References:
See also references of EP 2777930A4
Attorney, Agent or Firm:
EMORI KENJI (JP)
Kenji Emori (JP)
Kenji Emori (JP)
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Claims: