Title:
GAS BARRIER FILM, METHOD FOR PRODUCING SAME, ELECTRONIC DEVICE USING SAME AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2015/152302
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a gas barrier film which is capable of simplifying a step for removing an adhesive remaining after the removal of a protective film (50).
A gas barrier film (201) which comprises: a base (55); a gas barrier layer (52) that is arranged on one surface of the base (55); and a protective film (50) that is arranged on the gas barrier layer (52) with an adhesive layer (51) being interposed therebetween. The gas barrier layer (52) is formed by modifying a coating film, which is obtained by applying a coating liquid containing a polysilazane onto the base (55) and drying the applied coating liquid, by irradiating the coating film with an active energy ray. The C/Si elemental abundance ratio in the most surficial portion of the gas barrier layer (52) is 1.5 or less as measured in a state where the protective film (55) is separated therefrom.
Inventors:
OBUCHI REIKO (JP)
Application Number:
PCT/JP2015/060269
Publication Date:
October 08, 2015
Filing Date:
March 31, 2015
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; H05B33/02
Domestic Patent References:
| WO2011007543A1 | 2011-01-20 | |||
| WO2014007277A1 | 2014-01-09 | |||
| WO2012014653A1 | 2012-02-02 |
Foreign References:
| JP2012067193A | 2012-04-05 | |||
| JP2013123895A | 2013-06-24 | |||
| JP2013226758A | 2013-11-07 |
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
Hatta international patent business corporation (JP)
Hatta international patent business corporation (JP)
Download PDF: