Title:
GAS BARRIER FILM AND METHOD FOR PRODUCING GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2019/230280
Kind Code:
A1
Abstract:
The present invention provides a method for producing a gas barrier film, which is capable of suppressing decrease in adhesion between a base material film and a gas barrier layer, and which is also capable of suppressing decrease in the gas barrier properties. According to the present invention, a gas barrier film is produced by a step wherein a gas barrier layer is formed on a base material film by a vapor-phase film formation method, said base material film containing a resin, organic fine particles and a halogenated hydrocarbon that serves as an organic solvent. The content of the halogenated hydrocarbon in the base material film before the formation of the gas barrier layer is from 10 ppm to 1,000 ppm (inclusive).
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Inventors:
MIYAZAKI MIHO (JP)
HIROSAWA SHOTA (JP)
HIROSAWA SHOTA (JP)
Application Number:
PCT/JP2019/017426
Publication Date:
December 05, 2019
Filing Date:
April 24, 2019
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; C08F212/08; C08F220/10; C08J7/043; C08J7/048; C08K5/02; C08L65/00; C23C14/02; C23C16/02
Foreign References:
| JP2013083795A | 2013-05-09 | |||
| JP2006264118A | 2006-10-05 | |||
| JP2007076207A | 2007-03-29 | |||
| JP2016097500A | 2016-05-30 |
Attorney, Agent or Firm:
SHIN-YU INTERNATIONAL PATENT FIRM (JP)
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