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Title:
GAS BARRIER FILM, AND GAS BARRIER FILM MOLDING METHOD
Document Type and Number:
WIPO Patent Application WO/2018/101027
Kind Code:
A1
Abstract:
When the composition of a gas barrier layer is represented by SiOxCy, the total of the region with a y<0.20 composition and the region with a y>1.40 composition of a gas barrier film is less than 20 nm in the thickness direction. Moreover, the gas barrier film has a region that is substantially flat and a region with a three-dimensionally curved surface surrounded by the flat region, and a 0.5 mm or greater average gap is formed between the region with the three-dimensionally curved surface and a flat plate.

Inventors:
MORI TAKAHIRO (JP)
Application Number:
PCT/JP2017/040900
Publication Date:
June 07, 2018
Filing Date:
November 14, 2017
Export Citation:
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Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; C23C16/42
Domestic Patent References:
WO2016159206A12016-10-06
WO2015053189A12015-04-16
WO2007123006A12007-11-01
WO2014123201A12014-08-14
Foreign References:
JPH09216654A1997-08-19
JP2010234718A2010-10-21
JP2003205266A2003-07-22
JP2008087170A2008-04-17
JPS6282018A1987-04-15
JP2015206096A2015-11-19
JP2014083691A2014-05-12
JP2930722B21999-08-03
Attorney, Agent or Firm:
SHIN-YU INTERNATIONAL PATENT FIRM (JP)
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