Title:
GAS BARRIER FILM, AND PREPARATION METHOD THEREFOR
Document Type and Number:
WIPO Patent Application WO/2014/193199
Kind Code:
A1
Abstract:
The present invention relates to a gas barrier film, wherein a stress relaxation layer, a barrier layer and a UV screening layer are sequentially formed on a substrate, the a barrier layer comprises silica (SiOx, 1.5≤x≤2.5), the stress relaxation layer is an inorganic layer or an organic-inorganic mixture layer, the UV screening layer comprises metal oxide microparticles, and the water permeability measured by ASTM F-1249 is approximately (5×10-4)g/(m2ㆍday) or less. The gas barrier film has remarkable gas barrier properties, enables non-vacuum wet coating, and thus has a short preparation time, excellent flexibility, transparency and UV absorption, and remarkably prevents cracks.
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Inventors:
LEE DAE GYU (KR)
KANG SE YEONG (KR)
KIM BYUNG SOO (KR)
KIM SUNG KOOK (KR)
LEE EUN HWA (KR)
JEONG YU JEONG (KR)
CHOI WOO SUK (KR)
KANG SE YEONG (KR)
KIM BYUNG SOO (KR)
KIM SUNG KOOK (KR)
LEE EUN HWA (KR)
JEONG YU JEONG (KR)
CHOI WOO SUK (KR)
Application Number:
PCT/KR2014/004874
Publication Date:
December 04, 2014
Filing Date:
May 30, 2014
Export Citation:
Assignee:
CHEIL IND INC (KR)
International Classes:
B32B27/06; B32B27/18; B32B37/02; C08J5/18; C08J7/046; C08J7/048
Foreign References:
| JP2011238355A | 2011-11-24 | |||
| JP2006297737A | 2006-11-02 | |||
| JP2013086445A | 2013-05-13 | |||
| KR20080012552A | 2008-02-12 | |||
| JP2011218586A | 2011-11-04 |
Attorney, Agent or Firm:
AJU KIM CHANG & LEE (KR)
특허법인아주양헌 (KR)
특허법인아주양헌 (KR)
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