Title:
GAS BARRIER FILM PRODUCTION METHOD, GAS BARRIER FILM, AND ORGANIC PHOTOELECTRIC TRANSDUCER
Document Type and Number:
WIPO Patent Application WO/2012/008277
Kind Code:
A1
Abstract:
Disclosed is a gas barrier film production method comprising: a coating step in which an application liquid containing a polysilazane compound is applied on a substrate to form a coating film; and an ultraviolet irradiation step in which the substrate is moved relative to a light source, and vacuum ultraviolet light is applied to the coating film, thereby forming a gas barrier layer. In the ultraviolet irradiation step, the illuminance of the vacuum ultraviolet light received by the coating film on the coating film surface is not more than 160 mW/cm2, and the amount of energy of the vacuum ultraviolet light on the coating film surface received during an interval (T), in which the illuminance of the vacuum ultraviolet light on the coating film surface is between 50 mW/cm2 and 160 mW/cm2, is between 180 mJ/cm2 and 1800 mJ/cm2. The gas barrier film production method is suitable for the roll-to-roll production method, and enables gas barrier films to be produced with excellent productivity, and excellent gas barrier performance.
Inventors:
MORI Takahiro (Inc. 1, Sakura-machi, Hino-sh, Tokyo 11, 〒1918511, JP)
Application Number:
JP2011/064376
Publication Date:
January 19, 2012
Filing Date:
June 23, 2011
Export Citation:
Assignee:
Konica Minolta Holdings, Inc. (6-1 Marunouchi 1-chome, Chiyoda-ku Tokyo, 05, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
コニカミノルタホールディングス株式会社 (〒05 東京都千代田区丸の内一丁目６番１号 Tokyo, 〒1000005, JP)
International Classes:
B05D7/24; B05D3/06; B32B9/00; B32B27/00; H01L31/04; H01L51/42
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Claims:
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