Title:
GAS BARRIER FILM PRODUCTION METHOD
Document Type and Number:
WIPO Patent Application WO/2019/031262
Kind Code:
A1
Abstract:
[Problem] To provide a production method enabling high-speed production of a gas barrier film with excellent transparency and gas barrier properties. [Solution] This method, for producing a gas barrier film comprising an inorganic thin-film layer laminated on at least one surface of a polymer substrate, is characterized in that said inorganic thin-film layer is formed with vacuum deposition, and is formed while an oxygen gas is introduced using Al and SiO2 as a deposition material.
Inventors:
KASHIWA MITSUHIRO (JP)
NUMATA HIROYUKI (JP)
ISEKI KIYOSHI (JP)
NUMATA HIROYUKI (JP)
ISEKI KIYOSHI (JP)
Application Number:
PCT/JP2018/028076
Publication Date:
February 14, 2019
Filing Date:
July 26, 2018
Export Citation:
Assignee:
TOYO BOSEKI (JP)
International Classes:
C23C14/08; B32B9/00; C23C14/24; C23C14/30
Foreign References:
| JPH07242760A | 1995-09-19 | |||
| JP2017020056A | 2017-01-26 | |||
| JP2004197171A | 2004-07-15 | |||
| JP2001341225A | 2001-12-11 | |||
| JP2001006442A | 2001-01-12 | |||
| JPH07242760A | 1995-09-19 |
Other References:
See also references of EP 3666922A4
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