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Title:
GAS BARRIER FILM, PRODUCTION METHOD THEREOF AND POLARIZING PLATE AND IMADE DISPLAY WITH GAS BARRIER LAYER
Document Type and Number:
WIPO Patent Application WO/2022/172957
Kind Code:
A1
Abstract:
A gas barrier film (1) is provided with a gas barrier layer (20) on at least one face of a transparent film (11). The gas barrier layer (20) comprises a silicon oxynitride layer (231) comprising silicon, oxygen and nitrogen as constituent elements. The silicon oxynitride layer (231) preferably has an infrared absorption peak in 2,180-2,280 cm-1. In one embodiment, the silicon oxynitride layer (231) is formed according to CVD by introducing trisilylamine, nitrogen and oxygen into a chamber.

Inventors:
ITOH HONAMI (JP)
MIYAMOTO KODAI (JP)
NASHIKI TOMOTAKE (JP)
Application Number:
PCT/JP2022/005128
Publication Date:
August 18, 2022
Filing Date:
February 09, 2022
Export Citation:
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Assignee:
NITTO DENKO CORP (JP)
International Classes:
B32B9/00; B32B27/00; C23C16/42; H01L51/50; H05B33/02
Foreign References:
JP2012179763A2012-09-20
JP2010064303A2010-03-25
JP2016022596A2016-02-08
JP2008545061A2008-12-11
JP2015506903A2015-03-05
JP2004292877A2004-10-21
Attorney, Agent or Firm:
HARUKA PATENT & TRADEMARK ATTORNEYS (JP)
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