Title:
GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2012/137662
Kind Code:
A1
Abstract:
The purpose of the present invention is to provide a gas barrier film which has high gas barrier properties and excellent repeated reproducibility of the gas barrier properties. A gas barrier film which is obtained by sequentially laminating layer (A) and layer (B) described below on at least one surface of a polymer base. Layer (A): a crosslinked resin layer having a pencil hardness of H or more and a surface free energy of 45 mN/m or less Layer (B): a silicon-containing inorganic layer having a thickness of 10-1000 nm
Inventors:
UEBAYASHI HIROYUKI
TSUKAMURA YUSUKE
WATANABE OSAMU
TSUKAMURA YUSUKE
WATANABE OSAMU
Application Number:
PCT/JP2012/058388
Publication Date:
October 11, 2012
Filing Date:
March 29, 2012
Export Citation:
Assignee:
TORAY INDUSTRIES (JP)
UEBAYASHI HIROYUKI
TSUKAMURA YUSUKE
WATANABE OSAMU
UEBAYASHI HIROYUKI
TSUKAMURA YUSUKE
WATANABE OSAMU
International Classes:
B32B9/00
Foreign References:
| JP2009125965A | 2009-06-11 | |||
| JP2005289041A | 2005-10-20 | |||
| JP2002154184A | 2002-05-28 | |||
| JPH08142252A | 1996-06-04 | |||
| JP2002113826A | 2002-04-16 |
Other References:
"Introduction to X-ray Reflectivity", 2009, KOUDANSHA, pages: 51 - 78
IWAMORI SATORU, MACROMOLECULE SURFACE PROCESSING TECHNOLOGY, pages 118 - 119
See also references of EP 2695732A4
IWAMORI SATORU, MACROMOLECULE SURFACE PROCESSING TECHNOLOGY, pages 118 - 119
See also references of EP 2695732A4
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Claims: