Title:
GAS-BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2014/103756
Kind Code:
A1
Abstract:
Provided is a gas-barrier film which exhibits a low water vapor permeability and high impact resistance. A gas-barrier film comprises a substrate, a barrier layer that is formed on one surface of the substrate and that contains silicon, oxygen and carbon, and an organic layer, said barrier layer satisfying all of the requirements: (i) in a region occupying at least 90% of the film thickness of the barrier layer, the atomic ratio of oxygen, the atomic ratio of silicon, and the atomic ratio of carbon decrease in this order; (ii) the carbon distribution curve has at least two extreme values; and (iii) the absolute value of difference between the maximum and minimum atomic ratios of carbon on the carbon distribution curve is 3at% or more.
Inventors:
TAKAGI HIROSHI (JP)
Application Number:
PCT/JP2013/083515
Publication Date:
July 03, 2014
Filing Date:
December 13, 2013
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; C23C14/12; C23C16/42; H01L51/50; H05B33/02
Foreign References:
| JP2012084306A | 2012-04-26 | |||
| JP2006188743A | 2006-07-20 | |||
| JP2008265855A | 2008-11-06 | |||
| JP2005288851A | 2005-10-20 | |||
| JP2002532850A | 2002-10-02 | |||
| JP2530350B2 | 1996-09-04 |
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
Hatta international patent business corporation (JP)
Hatta international patent business corporation (JP)
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