Title:
GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2016/136842
Kind Code:
A1
Abstract:
Provided is a gas barrier film with excellent durability in a high-temperature, high-humidity environment. The gas barrier film has: a layer (A) containing a transition-metal compound formed on a resin base material by vapor deposition; and a silicon-containing layer (B) in contact with the layer (A) and obtained by applying and drying an application liquid containing a silicon-containing compound. In an atomic composition distribution profile obtained when performing an XPS composition analysis in the thickness direction of the gas barrier film, the gas barrier film has a region (a) that satisfies expression (1) and expression (2) when the atomic composition is represented by SiMxNy. SiMxNy: 0.2 ≤ x ≤ 3.0 (1), 0 ≤ y ≤ 0.6 (2)
Inventors:
TAKEMURA CHIYOKO (JP)
Application Number:
PCT/JP2016/055527
Publication Date:
September 01, 2016
Filing Date:
February 24, 2016
Export Citation:
Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; B32B15/08; C23C14/08; H01L51/50; H05B33/04
Foreign References:
| JP2014151571A | 2014-08-25 | |||
| JP2015003464A | 2015-01-08 | |||
| JP2014201033A | 2014-10-27 | |||
| JP2014201032A | 2014-10-27 | |||
| JP2008049695A | 2008-03-06 |
Attorney, Agent or Firm:
HATTA & ASSOCIATES (JP)
Hatta international patent business corporation (JP)
Hatta international patent business corporation (JP)
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