GAS BARRIER FILM - KONICA MINOLTA INC

Title:

GAS BARRIER FILM

Document Type and Number:

WIPO Patent Application WO/2016/194559

Kind Code:

A1

Abstract:

[Problem] To provide a gas barrier film having excellent durability in a high-temperature and high-humidity environment. [Solution] This gas barrier film includes a resin substrate and a silicon-containing layer, wherein the silicon-containing layer has a region (A) in which the atomic composition distribution profile obtained from an XPS composition analysis performed in the thickness direction satisfies equation (1) when the composition is represented by SiMxNyOz, and the region (A) is a layer formed by ion implantation or ion plating.

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Inventors:

OBUCHI REIKO (JP)

Application Number:

PCT/JP2016/063905

Publication Date:

December 08, 2016

Filing Date:

May 10, 2016

Export Citation:

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Assignee:

KONICA MINOLTA INC (JP)

International Classes:

B32B9/00; C23C14/08; C23C14/10; C23C14/32; C23C16/42

Foreign References:

JP2013000977A	2013-01-07
JP2011238567A	2011-11-24
JP2008100368A	2008-05-01
JP2010284845A	2010-12-24

Attorney, Agent or Firm:

HATTA & ASSOCIATES (JP)
Hatta international patent business corporation (JP)

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