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Patent Searching and Data


Title:
GAS BARRIER FILM
Document Type and Number:
WIPO Patent Application WO/2017/013980
Kind Code:
A1
Abstract:
The present invention addresses the problem of providing a gas barrier film that has excellent gas barrier properties and exceptional durability in high-temperature and high-humidity environments, specifically in terms of having exceptional adhesion between a gas barrier layer and a base material even when subjected to a high-temperature and high-humidity environment. This gas barrier film is characterized by including a laminate C in which a foundation layer A that contains a compound including a transition metal M1 and a gas barrier layer B that contains at least silicon (Si) and nitrogen (N) and that is formed in contact with the foundation layer A are laminated in the stated order, and is characterized in that when the thickness-direction composition of the laminate C is analyzed by XPS, the transition metal M1 and Si are present together in the interface region between the foundation layer A and the gas barrier layer B, a region D is present in which the value of the atomic ratio of the transition metal M1/Si is within the range of 0.11-9.0, and the thickness of the region D is at least 5 nm.

Inventors:
YASUI CHIKARA (JP)
Application Number:
PCT/JP2016/068206
Publication Date:
January 26, 2017
Filing Date:
June 20, 2016
Export Citation:
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Assignee:
KONICA MINOLTA INC (JP)
International Classes:
B32B9/00; B05D7/24; C08J7/043; C08J7/046; C08J7/048
Domestic Patent References:
WO2014109356A12014-07-17
WO2013161809A12013-10-31
Foreign References:
JP2014226894A2014-12-08
JP2014151571A2014-08-25
Attorney, Agent or Firm:
KOYO INTERNATIONAL PATENT FIRM (JP)
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