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Patent Searching and Data


Title:
GAS CONTROL APPARATUS
Document Type and Number:
WIPO Patent Application WO/2013/084909
Kind Code:
A1
Abstract:
A gas control apparatus (100) is constituted of an upper housing (10) to which a second piezoelectric pump (102) is connected, a lower housing (20) to which a first piezoelectric pump (101) is connected, and a diaphragm (30). An outlet (19) through which gas flows out is disposed at the upper housing (10). Inlets (28 and 29) through which gas flows in, an opening (126), a first valve seat (152), a second valve seat (132), and a third valve seat (142) are disposed at the lower housing (20). The diaphragm (30) is clamped by the upper housing (10) and the lower housing (20), and fixed to the upper housing (10) and the lower housing (20) in contact with the first valve seat (152), the second valve seat (132), and the third valve seat (142). The diaphragm (30) divides the upper housing (10) and the lower housing (20) inside so that each valve chamber is formed together with the upper housing (10) and the lower housing (20).

Inventors:
KAMITANI GAKU (JP)
HIRATA ATSUHIKO (JP)
Application Number:
JP2012/081453
Publication Date:
June 13, 2013
Filing Date:
December 05, 2012
Export Citation:
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Assignee:
MURATA MANUFACTURING CO., LTD. (10-1, Higashikotari 1-chome Nagaokakyo-sh, Kyoto 55, 〒6178555, JP)
International Classes:
F04B41/06; F04B39/10; F04B39/12; F04B41/00; F04B45/047
Domestic Patent References:
WO2011145544A12011-11-24
Foreign References:
JPS6252291U1987-04-01
JPH0420751A1992-01-24
Attorney, Agent or Firm:
KAEDE PATENT ATTORNEYS' OFFICE (1-4-34, Noninbashi Chuo-ku, Osaka-sh, Osaka 11, 〒5400011, JP)
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Claims: