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Title:
GAS DELIVERY AND DISTRIBUTION FOR UNIFORM PROCESS IN LINEAR-TYPE LARGE-AREA PLASMA REACTOR
Document Type and Number:
WIPO Patent Application WO/2013/040127
Kind Code:
A3
Abstract:
An apparatus for introducing gas into a processing chamber comprising one or more gas distribution tubes having gas-injection holes which may be larger in size, greater in number, and/or spaced closer together at sections of the gas introduction tubes where greater gas conductance through the gas-injection holes is desired. An outside tube having larger gas-injection holes may surround each gas distribution tube. The gas distribution tubes may be fluidically connected to a vacuum foreline to facilitate removal of gas from the gas distribution tube at the end of a process cycle.

Inventors:
WHITE JOHN M (US)
ANWAR SUHAIL (US)
KUDELA JOZEF (US)
SORENSEN CARL A (US)
WON TAE K (US)
CHO SEON-MEE (US)
CHOI SOO YOUNG (US)
PARK BEOM SOO (US)
JOHNSTON BENJAMIN M (US)
Application Number:
PCT/US2012/055009
Publication Date:
May 02, 2013
Filing Date:
September 13, 2012
Export Citation:
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Assignee:
APPLIED MATERIALS INC (US)
WHITE JOHN M (US)
ANWAR SUHAIL (US)
KUDELA JOZEF (US)
SORENSEN CARL A (US)
WON TAE K (US)
CHO SEON-MEE (US)
CHOI SOO YOUNG (US)
PARK BEOM SOO (US)
JOHNSTON BENJAMIN M (US)
International Classes:
C23C16/44; C23C16/455; H01L21/205
Foreign References:
US20100025370A12010-02-04
KR20090043794A2009-05-07
KR20110002238U2011-03-08
JP2006249576A2006-09-21
Attorney, Agent or Firm:
VERSTEEG, Steven H. et al. (L.L.P.3040 Post Oak Blvd., Suite 150, Houston Texas, US)
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