Title:
GAS INSENSITIVE MASS FLOW CONTROL SYSTEMS AND METHODS
Document Type and Number:
WIPO Patent Application WO/2017/115830
Kind Code:
A1
Abstract:
Gas insensitive systems and methods for controlling the mass flow rate of a gas through a primary conduit are disclosed. The method includes producing, in a secondary conduit, an assessment flow that has a changing pressure; calculating a first measure of a flow rate of the assessment flow based upon a rate-of-change of the pressure of the assessment flow; and measuring the assessment flow with a mass flow meter that is affected by the composition of the gas to produce a second measure of a flow rate of the assessment flow. An adjustment signal is generated based upon a difference between the first measure and the second measure, and a gas-corrected flow signal is generated by adjusting a measured-flow signal of a mass flow controller with the adjustment signal. The gas-corrected flow signal is used by the mass flow controller to control a flow rate of the gas through the primary conduit.
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| JPS55105707 | CONTROLLER FOR PUMP DELIVERY FLOW |
Inventors:
JOHNSON RYAN (US)
SMIRNOV ALEXEI V (US)
ALBRIGHT PATRICK (US)
JORDAN CY (US)
NAGARAJAN ARUN (US)
SMIRNOV ALEXEI V (US)
ALBRIGHT PATRICK (US)
JORDAN CY (US)
NAGARAJAN ARUN (US)
Application Number:
PCT/JP2016/089028
Publication Date:
July 06, 2017
Filing Date:
December 28, 2016
Export Citation:
Assignee:
HITACHI METALS LTD (JP)
International Classes:
G05D7/06; G05D7/00
Domestic Patent References:
| WO2015029890A1 | 2015-03-05 |
Foreign References:
| US20030149536A1 | 2003-08-07 | |||
| JPH05308053A | 1993-11-19 |
Attorney, Agent or Firm:
KOHNO, Hideto et al. (JP)
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