Title:
GAS LASER APPARATUS, LASER LIGHT EMITTING METHOD FOR GAS LASER APPARATUS, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
Document Type and Number:
WIPO Patent Application WO/2020/170350
Kind Code:
A1
Abstract:
This gas laser apparatus is provided with: a chamber in which a laser gas is sealed; a window provided in the chamber and transmitting laser light; an optical path tube which surrounds the location of the chamber where the window is provided, and which is connected to the chamber; a gas supply port for supplying a purge gas into the optical path tube; an exhaust port for exhausting the gas in the optical path tube; and a control unit. The exhaust port includes: a main exhaust port provided in the optical path tube so as to cause the gas to flow over a surface of the window; and a sub-exhaust port provided in the optical path tube upstream of a flow of gas in the optical path tube with respect to the location where the window is provided and the location where the main exhaust port is provided. The control unit may cause the gas to be exhausted from the main exhaust port before laser light is emitted from the chamber, and may cause the gas to be exhausted from the sub-exhaust port in at least a partial period in which laser light is emitted from the chamber.
More Like This:
Inventors:
TEI DAISUKE (JP)
Application Number:
PCT/JP2019/006241
Publication Date:
August 27, 2020
Filing Date:
February 20, 2019
Export Citation:
Assignee:
GIGAPHOTON INC (JP)
International Classes:
H01S3/036
Domestic Patent References:
| WO2015068205A1 | 2015-05-14 |
Foreign References:
| JP2018093211A | 2018-06-14 | |||
| JP2003133622A | 2003-05-09 | |||
| US20070171952A1 | 2007-07-26 |
Attorney, Agent or Firm:
MORIMURA Yasuo (JP)
Download PDF: