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Patent Searching and Data


Title:
GAS NOZZLE AND PLASMA DEVICE EMPLOYING SAME
Document Type and Number:
WIPO Patent Application WO/2014/119177
Kind Code:
A1
Abstract:
A gas nozzle according to an embodiment of the present invention comprises a columnar main body formed from a ceramic sintered body, whereupon through holes are formed wherethrough gas flows. Gas discharge apertures in the through holes are formed on one end face of the main body. Inner walls of the through holes further comprise first regions which are located near the discharge apertures, and second regions which are located further inward of the main body than the first regions. The first regions and the second regions are formed from an untreated face of the ceramic sintered body. Average crystal grain diameters in the first regions are greater than average crystal grain diameters in the second regions.

Inventors:
KAJIWARA YUKI (JP)
Application Number:
PCT/JP2013/084380
Publication Date:
August 07, 2014
Filing Date:
December 21, 2013
Export Citation:
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Assignee:
KYOCERA CORP (JP)
International Classes:
B05B1/00; H01L21/31; C23C16/44; C23C16/455; H01L21/3065; H01L21/316
Domestic Patent References:
WO2013065666A12013-05-10
Foreign References:
JP2003181326A2003-07-02
JP2003340318A2003-12-02
JP2012054266A2012-03-15
JPH092864A1997-01-07
JP2007063595A2007-03-15
JP2001181042A2001-07-03
JPH11214365A1999-08-06
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