GAS FOR PLASMA GENERATION, PLASMA GENERATION METHOD, AND ATMOSPHERIC PRESSURE PLASMA GENERATED THEREBY

WIPO Patent Application WO/2012/169588

A1

[Problem] The purpose of the present invention is to provide a gas for plasma generation that can easily generate a plasma from a gas that does not easily form a plasma such as oxygen, carbon monoxide, or nitric oxide, as well as to provide a plasma generation method and an atmospheric pressure plasma generated thereby. A further purpose is to enable application of plasma processing in many industrial fields by using the resulting atmospheric pressure plasma. [Solution] Provided is a gas for plasma generation used for generating an atmospheric pressure plasma. The gas for plasma generation is a mixed gas comprising a base gas (carrier gas) which not only has processing capability due to formation of a plasma, but also carries the gas for plasma generation as a whole to a plasma source, and a processing effectiveness enhancing gas that enhances the processing effectiveness of the atmospheric pressure plasma. Further, a generation support gas for supporting plasma forming is further mixed into the above mixed gas. The invention also provides a plasma generation method that uses the gas for plasma generation to generate a plasma, and an atmospheric pressure plasma that is generated from the gas for plasma generation.

OKINO AKITOSHI (JP)
MIYAHARA HIDEKAZU (JP)
SASAKI RYOTA (JP)

PCT/JP2012/064687

December 13, 2012

June 07, 2012

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TOKYO INST TECH (JP)
OKINO AKITOSHI (JP)
MIYAHARA HIDEKAZU (JP)
SASAKI RYOTA (JP)

H05H1/24; B08B3/08; C23C8/36; C23F4/00; C23G5/00; B01J19/08

JP2002159845A	2002-06-04
JP2011512616A	2011-04-21
JP2011023244A	2011-02-03
JP2011517368A	2011-06-02

NAKAO Shunsuke et al. (JP)
Shunsuke Nakao (JP)

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