GAS FOR PLASMA REACTION AND METHOD FOR PRODUCTION THEREOF

Title:

GAS FOR PLASMA REACTION AND METHOD FOR PRODUCTION THEREOF

Document Type and Number:

WIPO Patent Application WO/2000/071497

Kind Code:

A1

Abstract:

A gas for plasma reaction comprising octafluorocyclopentene, characterized in that the gas has a content of octafluorocyclopentene of 99.9 vol % or more, and the total amount of nitrogen and oxygen which are contained as residual trace gas components is 200 vol ppm or less. This high purity gas for plasma reaction can be produced by (1) a method comprising subjecting a crude octafluorocyclopentene to a rectification in an atmosphere of an inert gas belonging to Group 0, or (2) a method comprising reftificating a crude octafluorocyclopentene to a purity of 99.9 vol % or more, and subsequently removing residual impurities.

Inventors:

HIRAYAMA TOSHINOBU (JP)
YAMADA TOSHIRO (JP)
SUGIMOTO TATSUYA (JP)
SUGAWARA MITSURU (JP)

Application Number:

PCT/JP2000/003308

Publication Date:

November 30, 2000

Filing Date:

May 24, 2000

Export Citation:

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Assignee:

NIPPON ZEON CO (JP)
HIRAYAMA TOSHINOBU (JP)
YAMADA TOSHIRO (JP)
SUGIMOTO TATSUYA (JP)
SUGAWARA MITSURU (JP)

International Classes:

H01L21/302; C07C17/20; C07C17/38; C07C17/383; C07C17/389; C07C23/08; H01L21/205; H01L21/3065; H01L21/311; H01L21/312; H01L21/3213; (IPC1-7): C07C23/08; C23C16/50; H01L21/205; H01L21/302

Domestic Patent References:

WO1998019332A1

1998-05-07

Foreign References:

JPH04346428A	1992-12-02
JPH07335611A	1995-12-22

Other References: