GAS TEMPERATURE/HUMIDITY REGULATION METHOD AND GAS SUPPLY DEVICE

WIPO Patent Application WO/2011/048985

A1

When gas containing the amount of water vapor to be contained at desired temperature (Td) and relative humidity (Hd) is assumed, and the temperature at which the relative humidity of the gas is 100% is defined as an intermediate target temperature (Tc), the intermediate target temperature (Tc) is calculated from the desired temperature (Td) and relative humidity (Hd), the temperature of the gas is increased to the intermediate target temperature (Tc) while the relative humidity of the gas is increased to 100% by mixing the gas and the water vapor, and the relative humidity of the gas is regulated to the desired relative humidity (Hd) by heating the gas to the desired temperature (Td) while maintaining the amount of the water vapor contained in the gas heated to the intermediate target temperature (Tc). Consequently, the gas maintained at the desired temperature and humidity can be stably supplied.

OKUSA Takenori (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Ohaza-Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)
大草　武徳 (〒04 茨城県ひたちなか市大字市毛８８２番地　株式会社日立ハイテクノロジーズ　那珂事業所内 Ibaraki, 〒3128504, JP)

JP2010/067931

April 28, 2011

October 13, 2010

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HITACHI HIGH-TECHNOLOGIES CORPORATION (24-14, Nishi Shimbashi 1-chome Minato-k, Tokyo 17, 〒1058717, JP)
株式会社日立ハイテクノロジーズ (〒17 東京都港区西新橋一丁目２４番１４号 Tokyo, 〒1058717, JP)
OKUSA Takenori (HITACHI HIGH-TECHNOLOGIES CORPORATION 882, Ohaza-Ichige, Hitachinaka-sh, Ibaraki 04, 〒3128504, JP)

F24F11/02; F24F6/00; F24F6/18

KASUGA Yuzuru (Torii-nihonbashi Bldg, 4-1 Nihonbashi-honcho 3-chome, Chuo-k, Tokyo 23, 〒1030023, JP)

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